Professor David Andelman (Tel Aviv University) will give a talk on "Block Copolymers: Where Physics Meets Nano-Lithography".
Abstract: Diblock copolymers exhibit a wide variety of spatially modulated phases due to competing molecular and entropic forces. The resulting self-assembly nano-structures and morphologies have many uses and applications. In recent years an intensive effort has been devoted to control ordering of block copolymers close to surfaces and in thin film setups as is required by nano-lithography applications. In this talk, I will review the basic properties of block copolymers and recent progress aimed at understanding the ways to control orientation of anisotropic block copolymer phases and, in particular, manipulation of the polymer films using patterned surfaces and molds (Nano-Imprint-Lithography) to achieve the desired ordering and orientation of the film.
Place: Holon Institute of Technology, Faculty of Sciences, Seminar Room 424/8.